VINTAGE STRIPE

VINTAGE STRIPE

Regular price $103.00
(-$-103.00 off) Regular price Sale price $103.00
Shipping calculated at checkout.
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VINTAGE STRIPE

VINTAGE STRIPE

Regular price $103.00
(-$-103.00 off) Regular price Sale price $103.00
Shipping calculated at checkout.
Color BLUFF
Size SML

Hurry! Low Stock - Ready to Ship

Description

Elevate your wardrobe with our stylish and versatile polo, designed for both comfort and performance. Crafted from a premium wicking polyester/spandex stretch blend, this shirt ensures you stay cool and dry, making it perfect for any occasion, from casual outings to outdoor activities.

Featuring a printed jersey knit with multi-directional stretch, this polo offers exceptional flexibility and movement. The self-fabric, two-piece collar with a collar band adds a refined touch, while the classic 3-button placket provides a timeless look. The cross-stitched, matte polish, 4-hole buttons enhance durability and style, ensuring this piece stands the test of time.

For added comfort, the design includes crossover self-fabric side vents that promote airflow, making it an ideal choice for warm days. With UPF 50+ protection, you can confidently enjoy the sun while keeping your skin safe from harmful rays.

Made in the USA, this polo combines quality craftsmanship with modern design, making it a staple in any man's wardrobe. Easy to care for, simply machine wash and dry to maintain its vibrant look and feel.

Whether dressing up for a barbecue or enjoying a day out, this polo is the perfect blend of style and functionality. Upgrade your collection today and experience the perfect balance of comfort and sophistication!

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10% of today’s sales will go to the Daniel Murphy Scholarship Fund.

The mission of the Daniel Murphy Scholarship Fund is to unlock educational opportunities for talented Chicago-area students facing financial need. DMSF partners with Scholars, families, and schools through high school and beyond by providing scholarships, academic programs, and personal support so that each Scholar can reach their potential.